Home News Facilities Meetings Partners Members	PCAMM Facilities and Capabilities PCAMM provides surface analysis, materials characterization and custom thin film growth for a wide variety of clients, both from within the three universities and from other universities as well as from industry and government. State of the art capabilities are available for thin film growth and for a number of different surface analysis and other materials characterization techniques.  Growth and deposition equipment   MBE (molecular beam epitaxy) of ultrathin metallic films, primarily for magnetic applications  MOCVD (metalorganic chemical vapour deposition) of III-V compound semiconductors with emphasis on antimonides, as well as oxide semiconductors such as ZnO. MBE of III-V compound semiconductors and oxide materials such as YAG thin films for photonic devices. Microfabrication equipment deep uv and electron beam photolithography reactive ion etching plasma assisted cvd deposition sputtering, e-beam and thermal deposition systems extensive class 100 and class 10,000 cleanroom facilities rapid thermal annealing Analysis techniques SAM - scanning Auger microscopes: SFU, UBC STEM - 200 keV scanning transmission electron microscope: including Field Emission Gun (FEI Tecnai 20) LaB6 Filament (Hitachi 8100) SEM - scanning electron microscopes Dual Beam SEM/FIB (FEI 235) SEM (Bausch and Lomb) SPM - scanning probe microscopes AFM - atomic force microscope STM - scanning tunneling microscope XRD - high resolution X-ray diffractometers XPS - X-ray photoemission spectrometers: SFU, UBC SIMS - secondary ion mass spectrometer
PCAMM Simon Fraser University University of British Columbia BC, Canada  email: simonw@sfu.ca