Automated Design for Micromachining

Guckel Rings

Introduction

This cell implements an array of guckel rings. The radii of the rings varies throughout the array, allowing the residual tension to be estimated by inspection.

Layout of a Guckel ring.

Figure 1: Layout of a Guckel ring.

Theory

Please refer to the documentation on the guckel ring parameterized cell.

Parameters

Any parameter may be modified, if necessary, to meet design rules. Typically, this involves increasing parameters that specify distances, so that minimum line width and minimum line spacing rules will not be violated. This has been extended to the convention of specifying a zero for some parameters to obtain an instance of the minimum size.

In addition to the parameters listed below, several technology parameters also influence the implementation of parameterized cells. This data must be present in the technology library.

Table 1: Parameters for the 'guckel_rings' parameterized cell.
Name Description Range Units
layer This parameter is the drawing layer for the comb. These are POLY1, POLY2, or double-thickness structures. - -
radius (min) The radius of the smallest guckel ring. [0,∞) um
radius (max) The radius of the largest guckel ring. [0,∞) um
radius (step) When creating the guckel ring array, this is the difference in radius between adjacent rings. [0,∞) um
width The width of the ring. If less then the nominal width, this parameter will be increased. [0,∞) um
beam The width of the beam. If less then the nominal width, this parameter will be increased. [0,∞) um
width The width of the beam. While this may play a role in the Euler Buckling load, the buckling stress is independent of the width. This parameter is automatically increased if it is less than the nominal width. [0,∞) um
anchor size The size of the anchors used to connect the guckel ring to the substrate. If this value is less then the nominal width it will be increased. [0,∞) um
include_poly0 If true, a POLY0 ground plane will be included in the cell. The POLY0 ground plane can eliminate most electrostatic attraction between the Euler column and the substrate bulk. true/false -

References

The documentation for this parameterized cell does not contain any references.